Researchers from the Tokyo Institute of Technology (Tokyo Tech) developed a new MRAM cell structure that relies on unidirectional spin Hall magnetoresistance (USMR). The new cell structure is reportedly very simple with only two layers which could lead to lower-cost MRAM devices.

USMR MRAM cell structure image

The spin Hall effect leads to the accumulation of electrons with a certain spin on the lateral sides of a material. By combining a topological insulator with a ferromagnetic semiconductor, the researchers managed to create a device with giant USMR.

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