Memory

Researchers from Seoul National University, Pohang University of Science and Technology, Korea Atomic Energy Research Institute and the Center for Quantum Materials in Korea have designed a prototype of a non-volatile magnetic memory device entirely based on a nanometer-thin layered material, which can be tuned with a tiny current. This finding opens up a new window of opportunities for future energy-efficient magnetic memories based on spintronics.

The choice of magnetic material and device architecture depends on the fact that non-volatile memory technologies have to guarantee safe storage, but also reliable reading and writing access. Hard magnets are perfect for long-term memory storage, because they magnetize very strongly and are difficult to demagnetize. On the contrary, soft magnets are desirable for adding new information to the memory device, because their magnetization can be easily reversed during the writing process. Put simply, ideal magnetic materials can be kept at a hard magnetic state to ensure the stability of the stored information, but be soft on demand.

Researchers from the University of Arizona discovered that in common Magnetic Tunnel Junctions (MTJ), there's a thin (2D) layer of Iron Oxide. This layer was found to act as a contaminant which lowers the performance achieved by MTJs.

This Iron Oxide layer, however, can also be seen as a blessing - the researchers discovered that the layer behaves as a so-called antiferromagnet at extremely cold temperatures (below -245 degrees Celsius). Antiferromagnets are promising as these can be manipulated at Terahertz frequencies, about 1,000 times faster than existing, silicon-based technology. This is the first research that shows how Antiferromagnets can be controlled as part of MTJs.

Researchers from the Tokyo Institute of Technology (Tokyo Tech) developed a new MRAM cell structure that relies on unidirectional spin Hall magnetoresistance (USMR). The new cell structure is reportedly very simple with only two layers which could lead to lower-cost MRAM devices.

The spin Hall effect leads to the accumulation of electrons with a certain spin on the lateral sides of a material. By combining a topological insulator with a ferromagnetic semiconductor, the researchers managed to create a device with giant USMR.

Researchers from the Moscow Institute of Physics and Technology, in collaboration with researchers from Germany and the Netherlands have developed a new memory technology they call optically-assisted MRAM which is based on changing the spin state via THz pulses.

The researchers say that the new technique is extremely efficient (the power required to switch a "bit" will be a thousand times smaller compared to current MRAM devices) and fast.