Toshiba announced that it has developed a MOSFET cell based on spintronics. Toshiba has introduced magnetic layers into the source and drain of a MOSFET cell, and successfully applied these to controlling spin direction by the spin-transfer-torque-switching (STS) method, and by applying gate and source/drain voltages. A magnetic tunnel junction is applied for write operation of STS in the magnetic layers, which are formed with full-Heusler alloy, an intermetallic that acts as a high spin polarizer.

Toshiba confirmed the practical performance in transistor level of the scalable spintronics-based MOSFET device that promises fast random write and access speeds with low power consumption. It opens the way to next-generation non-volatile semiconductor devices that can be used as reconfigurable logic devices, and non-volatile LSI chip with memory function.

Toshiba will promote development toward establishing fundamental technologies for application after 2015. This work was partly supported by the New Energy and Industrial Technology Development Organization (NEDO) in Japan.