Researchers suggest method to improve the processing of antiferromagnetic devices for spintronic memory technologies
A team led by researchers at the National Institute of Standards and Technology (NIST), the University of South Florida (USF), Harvey-Mudd College and the University of the District of Columbia has discovered a route toward reducing the sputter damage during growth of Nanolayered Pt/Co/Ir-based Synthetic Antiferromagnets that delivers significant improvements in perpendicular magnetic anisotropy and interlayer exchange coupling energy.
Synthetic antiferromagnets (SAFs) are a core component for top-pinned magnetic tunnel junction memory systems in semiconductor production. Establishing low-damage sputtering techniques to protect the multiple interfaces between sub-nm thick constituent layers delivers improved SAF properties could be key to data retention in high-density, sub-10 nm diameter magnetic memory arrays.